Photo Resist Removal
SU8 Resist Removal
Microwave plasma cleaner are an economical way to uniformly, safely, and completely plasma clean.
Photoresist can be removed quite easily with a plasma process, usually with microwave excitation.
SU8 Removal/ Sacrificial Layer Removal
SU8 photoresist can also be removed safely with a microwave plasma process.
It has been proven successfully in many cases for R&D as well as in production.
Using a simple plasma process, the radicals created by microwave excitation will easily remove this polymer even from very deep and narrow trenches.
If the corners are SHARP, the metal will NOT overflow! This is a well-known physical effect. The liquid metal cannot overcome the SHARP edge due to its surface tension.
Plasma descum is the process of removing residual photoresist in holes and other deep areas.
We provide all kind of plasma solutions in most of the Asian countries including Malaysia.