The Alpha Plasma System AL 18 is ideal for small-volume production, pilot line manufacturing and R&D purposes. Still important, the system will meet the full 360 degrees of today’s requirements in advanced chip packaging.
The AL 18 system is also featuring the innovative Alpha Plasma design and microwave coupling. The tool is truly versatile. Proven ECR technique is just an example from the wide range of operating modes. The classic rotary table configuration is available as well.
Process chamber: Aluminum Volume: 18 liters Chamber size: W 250 mm × D 290 mm × H 250 mm Chamber door: Hinged – type with viewing port Microwave power: 2.45 GHz, adjustable between 50 and 600 Watts
Options Vacuum pump Gas Channel Rotary table ECR set-up Utilities: 3/N/PE AC 50 Hz 400/240 V 16 A Dimensions: W 530 mm × D 600 mm × H 550 mm Weight: 40 kg w/o pump ; approx . 100 kg w/ vacuum pump
Alpha Plasma develops and produces world-class, high quality plasma
systems for surface activation, cleaning and coating to the semiconductor and compound industries.