√.Advantages of the Microwave frequency of 2.45 GHz.
√.Removal of photo resist after high dose implantation.
√.After or before wet or dry etching
√.SU 8 and other resists based on epoxy process.
√.Sacrificial layers in MEMS fabrication.
The Plasma System series Q prepared for the installation in a cleanroom wall as well as a table top system.The system is suitable for wafers up to 125 mm and designed for semiconductor and microelectronics industry.
Process chamber: Quartz Glass Volume:6 liters Chamber size:diameter 150 mm, dept. 260 mm Microwave power:2.45 GHz Vacuum gauge:Pirani, 1 – 1000 Pa Vacuum system:DN 25 ISO-K Vacuum valve:Electro-pneumatic valve Options Vacuum pump Gas Channel Light tower Utilities:1 connection 3/N/PE AC 50/60 Hz 400/240 V 16 A Dimensions:W 500 mm ×D 370 mm × H 550 mm Weight:40 kg without pump
Alpha Plasma develops and produces world-class, high quality plasma
systems for surface activation, cleaning and coating to the semiconductor and compound industries.