√. Advantages of the Microwave frequency of 2.45 GHz. √. Removal of photo resist after high dose implantation. √. After or before wet or dry etching. √. SU 8 and other resists based on epoxy process. √. Sacrificial layers in MEMS fabrication.
The Plasma System series Q prepared for the installation in a cleanroom wall as well as a table top system. The system is suitable for wafers up to 200 mm and designed for semiconductor and microelectronics industry.
Process: chamber Quartz Glass Volume: 21 liters Chamber size: diameter 240 mm, dept. 460 mm Chamber door: aluminum, support rods attached to the door for manual or automatic loading according to the drawer principle, viewing port Support rods: aluminum, the rods are made by customer requirement Microwave power: 2.45 GHz, adjustable between 50 and 1200 Watts
Options Vacuum pump Gas Channel Light tower Process pressure control Utilities: 1 connection 3/N/PE AC 50/60 Hz 400/240 V 16 A for system and pump Dimensions: W760 mm × D770 mm × H 775 mm
Alpha Plasma develops and produces world-class, high quality plasma
systems for surface activation, cleaning and coating to the semiconductor and compound industries.